The degradation of quantum efficiency in negative electron affinity GaAs photocathodes under gas exposure
نویسندگان
چکیده
منابع مشابه
Patterned negative electron affinity photocathodes for maskless electron beam lithography
This work focuses on two issues crucial to achieving high throughput with a negative electron affinity semiconductor photocathode source. Monte Carlo simulations indicate that for a 50 kV system, as much as 8 mA of current may be delivered to the wafer to achieve a raw throughput of 20 8 in. wafers per hour with 0.1 mm minimum feature size ~assuming a resist sensitivity of 10 mC/cm!. In order t...
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ژورنال
عنوان ژورنال: Journal of Physics D: Applied Physics
سال: 2014
ISSN: 0022-3727,1361-6463
DOI: 10.1088/0022-3727/47/5/055110